Reducing Pollutants

Year 2009 (April 2009 to March 2010): Goals by Facility

SMIC Tochigi Plant

Dichloromethane

To be eliminated (completed as of September 2009).

HCFC-225

To be eliminated.

Dioctyl Phthalate (DOP)

To be eliminated.

Hydrobromic Acid

To be reduced by 60% against previous year.

Sintering Metal Recycling

Recycle rate to be improved.

SMIC Kansai Plant

Dichloromethane

To be eliminated.

Senju Electronics Co., Ltd. (SEC) Plant

Dichloromethane

Usage to be reduced by 30% against previous year.

Product-to-Waste Ratio

Waste ratio to be reduced by 0.4% against previous year.

Period	Waste Ratio
2008 (April 2008 to March 2009)	5.98%
2009 Target (April 2009 to March 2010)	5.58%